SAN FRANCISCO — Lithography photomasks are likely to continue to rely on the current standard 4X magnification and 26-millimeter field size through the 32-nanometer node, according to a consensus of ...

Laowa appears to be working on a new macro lens. This in itself isn't particularly noteworthy, as according to the official Venus Optics website (the parent company of the Laowa brand), there are ...

The existing lithography mask standard of 4x magnification with a 26mm field size is likely resilient enough to take the semiconductor industry to the 32 nm half-pitch generation, Sematech said ...

We’ll start by clarifying the definition of ‘macro’. True macro refers only to ‘life-size’ reproduction – which means a 1:1 reproduction (magnification) ratio. In other words, an object that is 20mm ...