As the Extreme Ultraviolet (EUV) lithography ecosystem is being actively mapped out to enable sub-7nm design rule devices, there is an immediate and imperative need to identify the EUV reticle (mask) ...
May 22, 2014. KLA-Tencor has announced the Teron SL650, a new reticle quality-control solution for IC fabs that supports 20-nm design nodes and beyond. With 193-nm illumination and multiple STARlight ...
NexTech Solutions, Inc. (Pink Sheets:NXSN) today announced shipment of the ORION fully automated reticle inspection system providing macro inspection of semiconductor reticles. The order was placed by ...
KLA-Tencor has introduced three advanced reticle inspection systems that address 10nm and below mask technologies: the Teron 640, Teron SL655 and Reticle Decision Center (RDC). All three systems are ...
“New cleaning processes and smaller pattern features on the mask have altered the landscape for reticle monitoring in the fab,” said Yalin Xiong, Ph.D., general manager of the Reticle Products ...
TOKYO--(BUSINESS WIRE)--Applied Materials, Inc. today released its Applied Tetra ™ Reticle Clean, the industry’s only wet clean system that delivers damage-free, >99% particle removal efficiency for ...
Actinic inspection, pellicle monitoring, and die-to-database verification drive demand as foundries enforce full reticle coverage and native-wavelength defect detection NEWARK, DE / ACCESS Newswire / ...
KLA has announced the eSL10 e-beam patterned-wafer defect inspection system, which is designed to accelerate time-to-market for high-performance logic and memory chips, including those that rely on ...
“Rules are derived to obtain specifications on radiance, power, lifetime, and cleanliness of the source for an actinic patterned mask inspection system. We focus on the physical processes and ...
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